Quadrio α Standalone High Volume | Strip System
Description:
The Quadrioα from SCI Automation Pte. Ltd. is a compact standalone plasma cleaning system suitable for substrates with a strip form factor.
Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.
Quadrioα comes in two versions:
- Quadrioα4 with 4 tracks, 400 UPH*
- Quadrioα5 with 5 tracks, 500 UPH*
Features:
- A 13.56 MHz RF system inclusive of an automatic tuning network
- Two mass flow controlled gas input lines
- A dry vacuum pump contained in the body of the machine
- A high precision capacitive pressure gauge
- An all-aluminum chamber with no welded joints, nickel-coated for maximum performance
- Two automatic doors
- A PC controller with a fieldbus and an LCD touch screen user interface
- An anti-jam system that protects the substrates, with automatic recovery function
Industries Served / Applications :
Aerospace, Defence, Military, Automotive, Industrial Automation, Medical, Solar Photovoltaic, Railways, E-Mobility, Renewable Energy, Telecommunication