Quadrio α Standalone High Volume | Strip System

Description:

The Quadrioα from SCI Automation Pte. Ltd. is a compact standalone plasma cleaning system suitable for substrates with a strip form factor.

Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.

Quadrioα comes in two versions:

  • Quadrioα4 with 4 tracks, 400 UPH*
  • Quadrioα5 with 5 tracks, 500 UPH*

Features:

  • A 13.56 MHz RF system inclusive of an automatic tuning network
  • Two mass flow controlled gas input lines
  • A dry vacuum pump contained in the body of the machine
  • A high precision capacitive pressure gauge
  • An all-aluminum chamber with no welded joints, nickel-coated for maximum performance
  • Two automatic doors
  • A PC controller with a fieldbus and an LCD touch screen user interface
  • An anti-jam system that protects the substrates, with automatic recovery function

Industries Served / Applications :

Aerospace, Defence, Military, Automotive, Industrial Automation, Medical, Solar Photovoltaic, Railways, E-Mobility, Renewable Energy, Telecommunication