BatchClean
Features and Benefits
- Fully automated wet chemical cleaning in a Batch type process
- Large variety of cleaning solutions available: RCA, acidic, alkaline, ozone based, …
- Throughput up to 8000 wafer/hour depending on configuration
- Integrated rinsing and drying of wafer
- Long bath lifetime due to feed-and-bleed function
- Tank-in-tank design for improved process homogeneity and reduced space requirement
- Best-in-class dosing system for accurate and constant bath composition
- Uses downholder-free carrier
- Lowest breakage rate in industry
- Easy maintenance
- Available as BatchClean N400 (400 wafer per bath), N200 (200 wafer per bath) or N50 (50 wafer per bath)
Options
- Adaption for thin wafer down to 100 µm
- MES interface (SECS/GEM)
- Load and Unload Extension for buffering carriers
- Media cabinet for chemical supply
- Waste pump station for chemical drain / wastewater
- Filter fan units (“Flowboxes”)
- Sensors for process control (e.g. pH, conductivity)